LONDON — U.S. chipmakers are using software from Applied Materials Inc. to check changes made by EDA vendors' optical proximity correction software for 65-nanometer manufacturing process development, ...

The computing demands of modern applications, especially those making heavy use of AI, are extending pressure beyond design ...

Some chip makers have been getting a boost from implementing optical proximity correction across the lithography process window at the 65- and even 90-nanometer nodes, but the practice will become ...

Experts at the Table: Semiconductor Engineering sat down to discuss optical and EUV photomasks issues, as well as the challenges facing the mask business, with Naoya Hayashi, research fellow at DNP; ...