Pattern matching (PM) was first introduced as the semiconductor industry began to shift from simple one-dimensional rule checks to the two-dimensional checks required by sub-resolution lithography.

Unlock the full InfoQ experience by logging in! Stay updated with your favorite authors and topics, engage with content, and download exclusive resources. Vivek Yadav, an engineering manager from ...

Take advantage of pattern matching improvements in C# 8.0 to write code that is more readable, maintainable, and efficient Pattern matching is an excellent feature that was introduced in C# 7. You can ...

Unlock the full InfoQ experience by logging in! Stay updated with your favorite authors and topics, engage with content, and download exclusive resources. In this episode, Thomas Betts chats with ...

Design patterns have a wide variety of applications in the design, verification and test flows of IC development. From significantly reducing rule deck complexity to simplifying the task of avoiding ...

Pattern matching is best known for its use in detecting lithographic hotspots, but it’s also widely used across all physical verification flows, and has expanded into design-for-manufacturing (DFM) ...

The creators of the Python language are mulling a new proposal, PEP 622, that would finally bring a pattern matching statement syntax to Python. The new pattern matching statements would give Python ...

As design nodes drop below 45nm, design rules are exploding in number and complexity, making design rule checking (DRC) harder and lengthier. What we have observed across the industry is that the ...