New type of EUV lithography using only four reflective mirrors overturns conventional technology and will contribute to advanced semiconductors at 7nm and below Okinawa Institute of Science and ...

A California-based laboratory is set to lay the groundwork for the next evolution of extreme ultraviolet (EUV) lithography. Led by Lawrence Livermore National Laboratory (LLNL), the project aims for ...

Lithography expert ASML has had an export license revoked by the Dutch government, stopping it from shipping chip-making systems to China. “A license for the shipment of NXT:2050i and NXT:2100i ...

The recent unveiling of a new local deep ultraviolet (DUV) lithography machine model by China's Ministry of Industry and Information Technology (MIIT) has become a hot topic of discussion online in ...

TSMC and ASML have announced a key milestone in extreme ultraviolet lithography (EUV) tech this week at the 2015 SPIE conference (SPIE is an international professional society for photonics and optics ...

Each low-numerical aperture (NA) extreme ultraviolet (EUV) lithography system costs over US$100 million, making it one of the most expensive semiconductor manufacturing tools in history. This raises a ...