Abstract: Achieving uniformity of patterns on photoresists is a significant challenge as process nodes get smaller. In practical production lines, the level sensor (LS) of the lithography system will ...
Abstract: Scaling trends in the alpha-particle and neutron induced SRAM SER shows an increase in the per-bit SER and percent multi-cell upsets at the 5-nm FinFET process compared to the 7-nm process.
SYRACUSE, N.Y. (WSYR-TV) — Amid a million-dollar project to fix the water main break forcing many Central New Yorkers to conserve water, officials said today that they expect the work to take at least ...
After the third outage, it seems the store is back online. Here's hoping it sticks! Steam down on Christmas Eve as holiday traffic overwhelms the site. It's the second outage today; DownDetector ...
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